Nano-lithographic arrays of Ferromagnetic Columns
  The below SEM micrograph shows an array of ferromagnetic columns (100nm diameter) fabricated using electron-beam lithography to form high aspect ratio holes, and subsequently filling them by electrodeposition of Ni. The geometry of the array and of the individual columns can be controlled and varied over a wide range of sizes, and spacing. The experimental study of these arrays will be useful for:

1) obtaining a fundamental understanding of hysterisis in bulk ferromagnetic media.

2) investigating the feasibility of recording on patterned perpendicular media, where one bit of information corresponds to the magnetization state of a single ferromagnetic column. We can expect to obtain densities of approximately 100 GBit/in2, which is two orders of magnitude greater than those currently available.